BASE LV.A-ESD-C

Glass-fibre reinforced polyamide based (PA) special conductive technopolymer, black colour, matte finish.

Surface resistivity = 10³ Ω (ASTM D257 measuring method).

Volume resistivity = 10³ Ωcm (ASTM D257 measuring method).

Bases without no-slip disk

• LV.A-ESD-C: without ground mounting.

• LV.F-ESD-C: with two holes at 180° for ground mounting, supplied covered by a breakable plastic diaphragm (which can be easily removed by a metal tool) to avoid all unhealthy deposits of dirt and dust when the ground mounting is not required (see Fig.1).

Bases with no-slip disk assembled

NBR rubber no-slip disk, hardness 70 Shore A, supplied assembled to the base.

Surface resistivity = 10³ Ω (ASTM D991 measuring method).

Volume resistivity = 10³ Ωcm (ASTM D991 measuring method).

The particular assembling system of the no-slip disk to the base assures a perfect anchoring, preventing separation even in case of impact during transport or of adhesion (sticking) to the floor (see No-slip disks).

• LV.A-AS-ESD-C: without ground mounting.

• LV.F-AS-ESD-C: with two holes at 180° for ground mounting, supplied covered by a breakable plastic diaphragm (which can be easily removed by a metal tool) to avoid all unhealthy deposits of dirt and dust when the ground mounting is not required (see Fig.1).

The special conductive technopolymer (ESD-C Electrostatic Discharge Conductive) prevents the accumulation of electrostatic charge.

The bases are suitable for "ESD PROTECTED AREA" (EPA) where components, which are susceptible to electrostatic discharges, are handled.

The (ESD-C) indelibly printed mark on the surface of the levelling elements bases identifies the particular conductive features of the material according to EN 100015/1 and IEC 61340-5-1.

The special knurling under the lower lip of the base provides excellent stability and grip when using the levelling element without no-slip disk even on surfaces that are not perfectly flat.

Note

To choose the stem see Tables of the possible combinations Bases/Stems().